DeutschFrançais
HomeProductsTechnologyCompanyDownloadsContactsPrinter friendly viewSitemapSearch
     
Section
Wafer Grinding




Component

Component: Wafer
Dimensions: Ø 2" - 12"
Material: Si, SiC, Sapphire (C-, A- and R-Plane), GaAs, GaN, etc.



Grinding Machine

Machine: Disco, Supfina, Okamoto, Strasbaugh, G&N, etc.
Grinding Op: thinning (rough- and fine grinding), backgrinding, reclaim grinding



Grinding Tool

Grinding Tool: rough grinding: 325 - 550 mesh
fine grinding: up to 8500 mesh



Results

Surface Finish Achieved: Ra 0.4 - Ra 0.015, depending on tool specification
Geometry Tolerances Achieved: TTV <2µm


We are pleased if we can help to solve your grinding problem


Fill out the Semiconductor Application Questionnaire
(a new window opens)


Or directly contact our specialist for Semiconductor Applications

Case Studies


Precision Grinding

Off Hand Grinding

Grinding Arbours

Dressing Systems

Artifex abrasives

Coated abrasives


[ Extended Search ]
You are here:
Home / Products / Case Studies / Face Grinding / Wafer Grinding
Last Update: 07.02.2012
© 2012 by Meister Abrasives. All rights reserved.
Webmaster